@article {92,
	title = {Improvement mechanism of sputtered AlN films by high-temperature annealing},
	journal = {Journal of Crystal Growth},
	volume = {502},
	year = {2018},
	month = {Jan-11-2018},
	pages = {41 - 44},
	issn = {00220248},
	doi = {10.1016/j.jcrysgro.2018.09.002},
	author = {Xiao, Shiyu and Suzuki, Ryoya and Miyake, Hideto and Harada, Shunta and Ujihara, Toru}
}
