@article {97,
	title = {Preparation of high-quality thick AlN layer on nanopatterned sapphire substrates with sputter-deposited annealed AlN film by hydride vapor-phase epitaxy},
	journal = {Japanese Journal of Applied Physics},
	volume = {58},
	year = {2019},
	month = {Jan-06-2019},
	pages = {SC1003},
	issn = {0021-4922},
	doi = {10.7567/1347-4065/ab0ad4},
	author = {Xiao, Shiyu and Jiang, Nan and Shojiki, Kanako and Uesugi, Kenjiro and Miyake, Hideto}
}
