Structural analysis of polarity inversion boundary in sputtered AlN films annealed under high temperatures

TitleStructural analysis of polarity inversion boundary in sputtered AlN films annealed under high temperatures
Publication TypeJournal Article
Year of Publication2019
AuthorsAkiyma T, Uchino M, Nakamura K, Ito T, Xiao S, Miyake H
JournalJapanese Journal of Applied Physics
Volume58
IssueSC
PaginationSCCB30
Date PublishedJan-06-2019
ISSN0021-4922
DOI10.7567/1347-4065/ab0d01
Short TitleJpn. J. Appl. Phys.